Inductively coupled plasma etching of GaN using Cl2/Ar and Cl2/N2 gases

J. K. Sheu, Y. K. Su, G. C. Chi, M. J. Jou, C. C. Liu, C. M. Chang, W. C. Hung

研究成果: Article同行評審

72 引文 斯高帕斯(Scopus)

摘要

This work investigates inductively coupled plasma (ICP) etching processes of GaN. Etching behaviors are also characterized by varying the ICP power, Cl2/Ar or Cl2/N2 mixing ratio, radio-frequency (rf) power, and chamber pressure. Experimental results indicate that the etching profiles are highly anisotropic over the range of etching conditions. Maximum etching rates of 8200 Å/min in Cl2/Ar plasma and 8330 Å/min in Cl2/N2 plasma are obtained as well. In addition, pressure, ICP power, Cl2/Ar(N2) flow ratio and rf power significantly influence etching rate and surface morphology. In particular, dc bias heavily influences the etching rates, suggesting that the ion-bombardment effect is an important factor of these etching processes.

原文English
頁(從 - 到)1970-1974
頁數5
期刊Journal of Applied Physics
85
發行號3
DOIs
出版狀態Published - 1999 2月

All Science Journal Classification (ASJC) codes

  • 物理與天文學 (全部)

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