Influence of Ta/Si atomic ratio on the interdiffusion between Ta-Si-N and Cu at elevated temperature

L. W. Lai, J. S. Chen, Wu Shiung Hsu

研究成果: Article

16 引文 斯高帕斯(Scopus)
原文English
頁(從 - 到)5396-5398
頁數3
期刊Journal of Applied Physics
94
發行號8
DOIs
出版狀態Published - 2003 十月 15

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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