Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes

K. Ohmori, P. Ahmet, K. Shiraishi, H. Watanabe, Y. Akasaka, K. Yamabe, M. Yoshitake, Kao-Shuo Chang, M. L. Green, K. Yamada, T. Chikyow

研究成果: Conference contribution

原文English
主出版物標題1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
頁面160-162
頁數3
DOIs
出版狀態Published - 2006 十二月 1
事件1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 - Mishima, Shizuoka, Japan
持續時間: 2006 一月 302006 二月 1

出版系列

名字2006 International Workshop on Nano CMOS - Proceedings, IWNC

Other

Other1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
國家Japan
城市Mishima, Shizuoka
期間06-01-3006-02-01

指紋

Annealing
Electrodes
Electric potential
Metals

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

引用此文

Ohmori, K., Ahmet, P., Shiraishi, K., Watanabe, H., Akasaka, Y., Yamabe, K., ... Chikyow, T. (2006). Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. 於 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 (頁 160-162). [4570988] (2006 International Workshop on Nano CMOS - Proceedings, IWNC). https://doi.org/10.1109/IWNC.2006.4570988
Ohmori, K. ; Ahmet, P. ; Shiraishi, K. ; Watanabe, H. ; Akasaka, Y. ; Yamabe, K. ; Yoshitake, M. ; Chang, Kao-Shuo ; Green, M. L. ; Yamada, K. ; Chikyow, T. / Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006. 2006. 頁 160-162 (2006 International Workshop on Nano CMOS - Proceedings, IWNC).
@inproceedings{f7c6dad8a6d8478891c1fb9bbdaf28b9,
title = "Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes",
author = "K. Ohmori and P. Ahmet and K. Shiraishi and H. Watanabe and Y. Akasaka and K. Yamabe and M. Yoshitake and Kao-Shuo Chang and Green, {M. L.} and K. Yamada and T. Chikyow",
year = "2006",
month = "12",
day = "1",
doi = "10.1109/IWNC.2006.4570988",
language = "English",
isbn = "142440603X",
series = "2006 International Workshop on Nano CMOS - Proceedings, IWNC",
pages = "160--162",
booktitle = "1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006",

}

Ohmori, K, Ahmet, P, Shiraishi, K, Watanabe, H, Akasaka, Y, Yamabe, K, Yoshitake, M, Chang, K-S, Green, ML, Yamada, K & Chikyow, T 2006, Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. 於 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006., 4570988, 2006 International Workshop on Nano CMOS - Proceedings, IWNC, 頁 160-162, 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006, Mishima, Shizuoka, Japan, 06-01-30. https://doi.org/10.1109/IWNC.2006.4570988

Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. / Ohmori, K.; Ahmet, P.; Shiraishi, K.; Watanabe, H.; Akasaka, Y.; Yamabe, K.; Yoshitake, M.; Chang, Kao-Shuo; Green, M. L.; Yamada, K.; Chikyow, T.

1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006. 2006. p. 160-162 4570988 (2006 International Workshop on Nano CMOS - Proceedings, IWNC).

研究成果: Conference contribution

TY - GEN

T1 - Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes

AU - Ohmori, K.

AU - Ahmet, P.

AU - Shiraishi, K.

AU - Watanabe, H.

AU - Akasaka, Y.

AU - Yamabe, K.

AU - Yoshitake, M.

AU - Chang, Kao-Shuo

AU - Green, M. L.

AU - Yamada, K.

AU - Chikyow, T.

PY - 2006/12/1

Y1 - 2006/12/1

UR - http://www.scopus.com/inward/record.url?scp=52149122933&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=52149122933&partnerID=8YFLogxK

U2 - 10.1109/IWNC.2006.4570988

DO - 10.1109/IWNC.2006.4570988

M3 - Conference contribution

AN - SCOPUS:52149122933

SN - 142440603X

SN - 9781424406036

T3 - 2006 International Workshop on Nano CMOS - Proceedings, IWNC

SP - 160

EP - 162

BT - 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006

ER -

Ohmori K, Ahmet P, Shiraishi K, Watanabe H, Akasaka Y, Yamabe K 等. Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. 於 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006. 2006. p. 160-162. 4570988. (2006 International Workshop on Nano CMOS - Proceedings, IWNC). https://doi.org/10.1109/IWNC.2006.4570988