Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes

K. Ohmori, P. Ahmet, K. Shiraishi, H. Watanabe, Y. Akasaka, K. Yamabe, M. Yoshitake, Kao-Shuo Chang, M. L. Green, K. Yamada, T. Chikyow

研究成果: Conference contribution

原文English
主出版物標題1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
頁面160-162
頁數3
DOIs
出版狀態Published - 2006 十二月 1
事件1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 - Mishima, Shizuoka, Japan
持續時間: 2006 一月 302006 二月 1

出版系列

名字2006 International Workshop on Nano CMOS - Proceedings, IWNC

Other

Other1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
國家Japan
城市Mishima, Shizuoka
期間06-01-3006-02-01

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

引用此

Ohmori, K., Ahmet, P., Shiraishi, K., Watanabe, H., Akasaka, Y., Yamabe, K., Yoshitake, M., Chang, K-S., Green, M. L., Yamada, K., & Chikyow, T. (2006). Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. 於 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 (頁 160-162). [4570988] (2006 International Workshop on Nano CMOS - Proceedings, IWNC). https://doi.org/10.1109/IWNC.2006.4570988