Influences of metal-precoated layers on pulsed current electrodeposition of ZnO nanorods on indium tin oxide substrates

Jih-Jen Wu, Ru Chun Chang, Chih Cheng Lin

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)

摘要

The influences of the Au- and Pt-precoated layers on ZnO nanorod growth have been investigated using the pulsed current electrodeposition method. Enhancement of the densities of the ZnO nanorod arrays is achieved using both metal-coated indium tin oxide (ITO) substrates whereas more significant improvement is obtained using the Au-precoated substrates. Tafel-plot analyses for the reaction of O H- formation by NO3- and H2O, which is a crucial step for the electrodeposition of ZnO using Zn (NO 3)2 electrolyte reveal that O H- formation through this reaction occurs in the limiting-current region at the Au/ITO substrate in the ZnO nucleation stage while the side reaction of H2 formation also takes place at the Pt/ITO and the bare ITO substrates under the same pulse current density in this study. We suggest that the low-density ZnO nanorods formed on the Pt-precoated and the bare ITO substrates are ascribed to the formation of H2 which would influence [O H-] on the surface. Because of an appropriate potential build up at the Au/ITO substrate, a high [O H-] exists on the surface of the Au/ITO substrate without being disturbed by H 2 significantly, resulting in high-density ZnO nanorods deposited on the Au/ITO substrates.

原文English
期刊Journal of the Electrochemical Society
155
發行號12
DOIs
出版狀態Published - 2008 十一月 5

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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