摘要
Indium tin oxide (250 nm) and Ni(5 nm)/Au(10 nm) films were successfully deposited onto both glass substrates and p-GaN epitaxial layers. The normalized transmittance of the as-deposited ITO film was 90.6% at 450 nm, which was much larger than that of Ni/Au film. The transmittance of the RF sputtered ITO film could be increased to 97.8% with in situ annealing. In situ annealing of ITO films would also improve the electrical properties of ITO on p-GaN. Nitride-based light-emitting diodes (LEDs) were also fabricated. It was found that the 20 mA forward voltage was 3.16 V, 5.74 V and 4.28 V for the LEDs with Ni/Au, as-deposited ITO and in situ annealed ITO p-contact layer, respectively.
| 原文 | English |
|---|---|
| 頁（從 - 到） | L21-L23 |
| 期刊 | Semiconductor Science and Technology |
| 卷 | 18 |
| 發行號 | 4 |
| DOIs | |
| 出版狀態 | Published - 2003 四月 1 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry
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Chang, C. S., Chang, S-J., Su, Y. K., Lin, Y-C., Hsu, Y. P., Shei, S. C., Chen, S. C., Liu, C. H., & Liaw, U. H. (2003). InGaN/GaN light-emitting diodes with ITO p-contact layers prepared by RF sputtering. Semiconductor Science and Technology, 18(4), L21-L23. https://doi.org/10.1088/0268-1242/18/4/102