Integrated facility layout and material handling system design in semiconductor fabrication facilities

Brett A. Peters, Taho Yang

研究成果: Article同行評審

91 引文 斯高帕斯(Scopus)

摘要

Semiconductor manufacturing is an important component of the U.S. manufacturing industry. Most of today's fabrication facilities and those being designed for the near future use a bay layout configuration and an overhead monorail system for moving material between bays. These material handling systems are usually designed with a spine or perimeter type of configuration. This paper investigates the layout and material handling system design integration problem in semiconductor fabrication facilities and proposes a methodology for solving this integrated design problem. A spacefilling curve approach is used to address the facility layout, while the structure of the spine and perimeter configurations are exploited to create a network flow problem to determine the material handling system design. Computational results are presented and show exceptional promise for this procedure in solving the integrated design problem in a semiconductor manufacturing environment.

原文English
頁(從 - 到)360-369
頁數10
期刊IEEE Transactions on Semiconductor Manufacturing
10
發行號3
DOIs
出版狀態Published - 1997

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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