TY - JOUR
T1 - Interpretations for coexistence of unipolar and bipolar resistive switching behaviors in Pt/NiO/ITO structure
AU - Tang, Hsien Heng
AU - Whang, Thou Jen
AU - Su, Yan Kuin
N1 - Publisher Copyright:
© 2019 The Japan Society of Applied Physics.
PY - 2019
Y1 - 2019
N2 - In this work, a Pt/NiO/ITO memory device is fabricated and characterized. Unipolar resistive switching (URS) and bipolar resistive switching (BRS) are both observed and reproduced. Results of X-ray photoelectron spectroscopy imply the presence of oxygen vacancy (V O) in the NiO film, and such defect is later proven to be intimated with both URS and BRS effects. Via current fitting to derive the conductive mechanisms for URS and BRS, we deduce that the impact of Schottky emission on the switching behavior could be mainly connected to the migration of oxygen anions (O2-) and recombination between O2- ions and VOs. However, the fitting results of I-V curves suggest the plausible principles dominating the URS and BRS could be quite different although the device is dominated by the same mechanisms in both URS and BRS operations.
AB - In this work, a Pt/NiO/ITO memory device is fabricated and characterized. Unipolar resistive switching (URS) and bipolar resistive switching (BRS) are both observed and reproduced. Results of X-ray photoelectron spectroscopy imply the presence of oxygen vacancy (V O) in the NiO film, and such defect is later proven to be intimated with both URS and BRS effects. Via current fitting to derive the conductive mechanisms for URS and BRS, we deduce that the impact of Schottky emission on the switching behavior could be mainly connected to the migration of oxygen anions (O2-) and recombination between O2- ions and VOs. However, the fitting results of I-V curves suggest the plausible principles dominating the URS and BRS could be quite different although the device is dominated by the same mechanisms in both URS and BRS operations.
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U2 - 10.7567/1347-4065/ab14cd
DO - 10.7567/1347-4065/ab14cd
M3 - Article
AN - SCOPUS:85069036477
SN - 0021-4922
VL - 58
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - SD
M1 - SDDE14
ER -