Introduction of new relaxation time constant of EHDA process from dielectric analyzing concept

Long Hsiang Li, Wei-Hsiang Lai

研究成果: Conference contribution

摘要

The electrohydrodynamic atomization (EHDA) distinguishes itself from conventional atomization method by introducing the electrostatic force into atomization process and having extraordinary performance over conventional ones especially on droplet-size distribution, and claimed approaching mono-dispersed. Associated physical models of EHDA modes and applications on medical, agricultural and manufacturing industry have been well established and improved in the past twenty years. Traditional EHDA researches concentrated on the behavior of the spray under external dc field. In this research, an attempt was made on acknowledging the time-dependence of the system on the circumstances while ac external field's being applied. A characteristic time called dipolar relaxation time, which came from the regime of dielectric physics, has been introduced into the current characteristic time system of EHDA process. Such treatment is proceeded under the fact that the permittivity of most material, despite of the deviations caused by temperature changes, being function of time history of external field application, as described in the dipolar part of dielectric relaxation process of molecules. Dramatic deviation of permittivity is expected around RF frequency or higher band of external applied field for most hydrocarbon liquids. This way makes current characteristic time system insufficient or even invalid to describe all phenomena along EHDA process. Research aims at the recognition of the relative importance of dipolar relaxation effect to the original charge relaxation one, which has to be figure out first to allow further experimental acknowledgement of the new characteristic time system.

原文English
主出版物標題10th International Conference on Liquid Atomization and Spray Systems, ICLASS 2006
出版狀態Published - 2006
事件10th International Conference on Liquid Atomization and Spray Systems, ICLASS 2006 - Kyoto, Japan
持續時間: 2006 八月 272006 九月 1

Other

Other10th International Conference on Liquid Atomization and Spray Systems, ICLASS 2006
國家/地區Japan
城市Kyoto
期間06-08-2706-09-01

All Science Journal Classification (ASJC) codes

  • 表面、塗料和薄膜

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