摘要
In this paper, high device linearity and characteristics of an InGaP/GaAs/InGaAs camel-like gate delta-doped p-channel field-effect transistor is demonstrated. The energy band and hole distribution are depicted with respect to the device performance. Due to the npn depletion of the camel-like gate structure, the considerable conduction band discontinuities at n+-InGaP/p-GaAs and p-GaAs/i-In0.15Ga0.85As heterojunctions, and the good confinement effect for holes in InGaAs quantum well, a large gate turn-on voltage is achieved. The drain saturation current linearly increases with the gate voltage and the high device linearity is illustrated by fitting the drain current versus the gate voltage. The excellent performance of the studied device is promise for linear amplifiers and high-frequency circuit applications.
原文 | English |
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頁(從 - 到) | 275-278 |
頁數 | 4 |
期刊 | Solid-State Electronics |
卷 | 54 |
發行號 | 3 |
DOIs | |
出版狀態 | Published - 2010 3月 1 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 凝聚態物理學
- 電氣與電子工程
- 材料化學