Investigation of low-cost surface processing techniques for large-size multicrystalline silicon solar cells

Jyh Jier Ho, Yuang Tung Cheng, William J. Lee, Song Yeu Tsai, Yung An Lu, Jia Jhe Liou, Shun Hsyung Chang, Kang L. Wang

研究成果: Article同行評審

15 引文 斯高帕斯(Scopus)

摘要

The subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125 × 125 mm2 were acid etched to produce simultaneously POCl3 emitters and silicon nitride deposition by plasma-enhanced chemical vapor deposited (PECVD). The study of surface morphology and reflectivity of different mc-Si etched surfaces has also been discussed in this research. Using our optimal acid etching solution ratio, we are able to fabricate mc-Si solar cells of 16.34 conversion efficiency with double layers silicon nitride (Si3N4) coating. From our experiment, we find that depositing double layers silicon nitride coating on mc-Si solar cells can get the optimal performance parameters. Open circuit (Voc) is 616mV, short circuit current (Jsc) is 34.1mA/cm2, and minority carrier diffusion length is 474.16 μm. The isotropic texturing and silicon nitride layers coating approach contribute to lowering cost and achieving high efficiency in mass production.

原文English
文章編號268035
期刊International Journal of Photoenergy
2010
DOIs
出版狀態Published - 2010

All Science Journal Classification (ASJC) codes

  • 一般化學
  • 原子與分子物理與光學
  • 可再生能源、永續發展與環境
  • 一般材料科學

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