Investigation of the structural and electrical characterization on ZrO 2 addition for ALD HfO2 with La2O3 capping layer integrated metal-oxide semiconductor capacitors

C. K. Chiang, J. C. Chang, W. H. Liu, C. C. Liu, J. F. Lin, C. L. Yang, J. Y. Wu, S. J. Wang

研究成果: Conference contribution

1 引文 斯高帕斯(Scopus)

指紋 深入研究「Investigation of the structural and electrical characterization on ZrO <sub>2</sub> addition for ALD HfO<sub>2</sub> with La<sub>2</sub>O<sub>3</sub> capping layer integrated metal-oxide semiconductor capacitors」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science