跳至主導覽 跳至搜尋 跳過主要內容

Investigations of GaN metal-oxide-semiconductor capacitors with sputtered HfO2 gate dielectrics

  • C. F. Shih
  • , K. T. Hung
  • , C. Y. Hsiao
  • , S. C. Shu
  • , W. M. Li

研究成果: Article同行評審

38   !!Link opens in a new tab 引文 斯高帕斯(Scopus)

指紋

深入研究「Investigations of GaN metal-oxide-semiconductor capacitors with sputtered HfO2 gate dielectrics」主題。共同形成了獨特的指紋。
排序方式

Keyphrases

Material Science