Larger surface profile measurement of microstructures by white-light phase-shifting interferometry and image stitching

T. Y. Chen, L. C. Yeh

研究成果: Conference contribution

摘要

White-light interferometry is very useful for highly resolved 3-D measurements of microscopic structures and micro devices. In this paper, a new stitching approach is developed to extend the measurement area. The characteristics of two neighboring images are enhanced by Laplacian filtering to reduce the effect of non-uniform illumination, and a proper sub-image is chosen based on the standard deviation of the sub-image for image correlation and stitching. Test of the method on the microstructure of a LCD panel shows that good stitching can be achieved within 1 pixel if the standard deviation of the comparing sub-image exceeds 7.1.

原文English
主出版物標題Society for Experimental Mechanics - SEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009
頁面2382-2386
頁數5
出版狀態Published - 2009
事件SEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009 - Albuquerque, NM, United States
持續時間: 2009 6月 12009 6月 4

出版系列

名字Society for Experimental Mechanics - SEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009
4

Other

OtherSEM Annual Conference and Exposition on Experimental and Applied Mechanics 2009
國家/地區United States
城市Albuquerque, NM
期間09-06-0109-06-04

All Science Journal Classification (ASJC) codes

  • 計算力學

指紋

深入研究「Larger surface profile measurement of microstructures by white-light phase-shifting interferometry and image stitching」主題。共同形成了獨特的指紋。

引用此