Long-period waveguide gratings with amorphous silicon cladding layer on silicon-on-insulator substrates realized by anisotropic wet etching

Wen-Kuei Chuang, Mao Teng Hsu, Guo Shian Wang

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

Long-period waveguide gratings (LPWGs) are designed and fabricated on silicon-on-insulator (SOI) substrates with an amorphous silicon (a-Si) layer incorporated as the cladding layer. Specifically, ridge waveguides are etched and patterned on SOI wafers via anisotropic wet etching and a-Si is deposited using a plasma-enhanced chemical vapor deposition (PECVD) system. The experimental results confirm that the resonant wavelengths of LPWG devices are within the range of 1563-1580nm and that an LPWG ridge waveguide of 8 μm wide yields a dip contrast as high as 29.5 dB and an FWHM as narrow as 1.76nm when the input light is transverse-electric (TE)-polarized. As for the transverse-magnetic (TM)- polarized input light, an LPWG waveguide of 10 μm width yields a dip contrast as high as 14.5 dB and a measured FWHM as narrow as 1.32 nm.

原文English
文章編號04EG15
期刊Japanese Journal of Applied Physics
53
發行號4 SPEC. ISSUE
DOIs
出版狀態Published - 2014 一月 1

All Science Journal Classification (ASJC) codes

  • 工程 (全部)
  • 物理與天文學 (全部)

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