Low frequency noise in quantum-well GexSi1-x PMOSFET's

J. Chang, D. K. Nayak, V. K. Raman, J. C.S. Woo, J. S. Park, K. L. Wang, C. R. Viswanathan

研究成果: Conference contribution

摘要

This paper describes the low frequency noise behavior of a quantum-well GexSi1-x p-channel MOSFET. Two noise mechanisms were involved in this buried channel device. At room temperature, generation-recombination (g-r) noise dominates, while at very low temperature, flicker (1/f) noise becomes important.

原文English
主出版物標題European Solid-State Device Research Conference
編輯M. Ilegems, M. Dutoit
發行者IEEE Computer Society
頁面19-22
頁數4
ISBN(電子)0444890661
出版狀態Published - 1991
事件21st European Solid State Device Research Conference, ESSDERC 1991 - Montreux, Switzerland
持續時間: 1991 9月 161991 9月 19

出版系列

名字European Solid-State Device Research Conference
ISSN(列印)1930-8876

Conference

Conference21st European Solid State Device Research Conference, ESSDERC 1991
國家/地區Switzerland
城市Montreux
期間91-09-1691-09-19

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程
  • 安全、風險、可靠性和品質

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