Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen

Waileong Chen, Chia Hao Tu, Keng Chih Liang, Chih Yi Liu, Chuan Pu Liu, Yonhua Tzeng

研究成果: Chapter

摘要

In this chapter, a novel, low-stress process for transferring thermal chemical vapor deposition (CVD) single-layer graphene from copper foils to destination substrates is demonstrated. An efficient transfer of graphene by directly fishing up the graphene with the target substrate rather than by using the “poly(methyl methacrylate) (PMMA)-based transfer” method is reported. Electrical and optical characteristics of the as-transferred graphene and the hydrogen remote-plasma-modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, a large-area, single-layer graphene is practically very fragile, especially during handling and transfer from one substrate to another. Handling of a large-area freestanding graphene is even more challenging. The combination of effective transfer and surface treatment of graphene by hydrogenation allows the fine-tuning of its electrical resistivity for practical applications.

原文English
主出版物標題Nanoelectronic Device Applications Handbook
發行者CRC Press
頁面365-372
頁數8
ISBN(電子)9781466565241
ISBN(列印)9781466565234
DOIs
出版狀態Published - 2017 一月 1

指紋

Graphene
Plasmas
Hydrogen
Substrates
Polymethyl methacrylates
Metal foil
Hydrogenation
Surface treatment
Chemical vapor deposition
Tuning
Copper

All Science Journal Classification (ASJC) codes

  • Engineering(all)

引用此文

Chen, W., Tu, C. H., Liang, K. C., Liu, C. Y., Liu, C. P., & Tzeng, Y. (2017). Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. 於 Nanoelectronic Device Applications Handbook (頁 365-372). CRC Press. https://doi.org/10.1201/b15035
Chen, Waileong ; Tu, Chia Hao ; Liang, Keng Chih ; Liu, Chih Yi ; Liu, Chuan Pu ; Tzeng, Yonhua. / Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. Nanoelectronic Device Applications Handbook. CRC Press, 2017. 頁 365-372
@inbook{f62861919de543e1a486e8b1357d22e4,
title = "Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen",
abstract = "In this chapter, a novel, low-stress process for transferring thermal chemical vapor deposition (CVD) single-layer graphene from copper foils to destination substrates is demonstrated. An efficient transfer of graphene by directly fishing up the graphene with the target substrate rather than by using the “poly(methyl methacrylate) (PMMA)-based transfer” method is reported. Electrical and optical characteristics of the as-transferred graphene and the hydrogen remote-plasma-modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, a large-area, single-layer graphene is practically very fragile, especially during handling and transfer from one substrate to another. Handling of a large-area freestanding graphene is even more challenging. The combination of effective transfer and surface treatment of graphene by hydrogenation allows the fine-tuning of its electrical resistivity for practical applications.",
author = "Waileong Chen and Tu, {Chia Hao} and Liang, {Keng Chih} and Liu, {Chih Yi} and Liu, {Chuan Pu} and Yonhua Tzeng",
year = "2017",
month = "1",
day = "1",
doi = "10.1201/b15035",
language = "English",
isbn = "9781466565234",
pages = "365--372",
booktitle = "Nanoelectronic Device Applications Handbook",
publisher = "CRC Press",

}

Chen, W, Tu, CH, Liang, KC, Liu, CY, Liu, CP & Tzeng, Y 2017, Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. 於 Nanoelectronic Device Applications Handbook. CRC Press, 頁 365-372. https://doi.org/10.1201/b15035

Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. / Chen, Waileong; Tu, Chia Hao; Liang, Keng Chih; Liu, Chih Yi; Liu, Chuan Pu; Tzeng, Yonhua.

Nanoelectronic Device Applications Handbook. CRC Press, 2017. p. 365-372.

研究成果: Chapter

TY - CHAP

T1 - Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen

AU - Chen, Waileong

AU - Tu, Chia Hao

AU - Liang, Keng Chih

AU - Liu, Chih Yi

AU - Liu, Chuan Pu

AU - Tzeng, Yonhua

PY - 2017/1/1

Y1 - 2017/1/1

N2 - In this chapter, a novel, low-stress process for transferring thermal chemical vapor deposition (CVD) single-layer graphene from copper foils to destination substrates is demonstrated. An efficient transfer of graphene by directly fishing up the graphene with the target substrate rather than by using the “poly(methyl methacrylate) (PMMA)-based transfer” method is reported. Electrical and optical characteristics of the as-transferred graphene and the hydrogen remote-plasma-modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, a large-area, single-layer graphene is practically very fragile, especially during handling and transfer from one substrate to another. Handling of a large-area freestanding graphene is even more challenging. The combination of effective transfer and surface treatment of graphene by hydrogenation allows the fine-tuning of its electrical resistivity for practical applications.

AB - In this chapter, a novel, low-stress process for transferring thermal chemical vapor deposition (CVD) single-layer graphene from copper foils to destination substrates is demonstrated. An efficient transfer of graphene by directly fishing up the graphene with the target substrate rather than by using the “poly(methyl methacrylate) (PMMA)-based transfer” method is reported. Electrical and optical characteristics of the as-transferred graphene and the hydrogen remote-plasma-modified graphene are presented. Although graphene is mechanically very strong considering its atomically thin structure, a large-area, single-layer graphene is practically very fragile, especially during handling and transfer from one substrate to another. Handling of a large-area freestanding graphene is even more challenging. The combination of effective transfer and surface treatment of graphene by hydrogenation allows the fine-tuning of its electrical resistivity for practical applications.

UR - http://www.scopus.com/inward/record.url?scp=85051773896&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85051773896&partnerID=8YFLogxK

U2 - 10.1201/b15035

DO - 10.1201/b15035

M3 - Chapter

AN - SCOPUS:85051773896

SN - 9781466565234

SP - 365

EP - 372

BT - Nanoelectronic Device Applications Handbook

PB - CRC Press

ER -

Chen W, Tu CH, Liang KC, Liu CY, Liu CP, Tzeng Y. Low-stress transfer of graphene and its tunable resistance by remote plasma treatments in hydrogen. 於 Nanoelectronic Device Applications Handbook. CRC Press. 2017. p. 365-372 https://doi.org/10.1201/b15035