Low temperature Au-Au bonding with VUV/O 3 treatment

Akiko Okada; Masatsugu Nimura; Naoko Unami; Akitsu Shigetou; Hirokazu Noma; Katsuyuki Sakuma; Jun Mizuno; Shuichi Shoji

doi:10.1109/3DIC.2012.6263015

Low temperature Au-Au bonding with VUV/O ₃ treatment

Akiko Okada, Masatsugu Nimura, Naoko Unami, Akitsu Shigetou, Hirokazu Noma, Katsuyuki Sakuma, Jun Mizuno, Shuichi Shoji

智慧與永續製造學位學程

研究成果: Conference contribution

1 引文斯高帕斯（Scopus）

摘要

This paper describes low temperature Au-Au bonding with vacuum ultraviolet (VUV) irradiation in the presence of oxygen gas. The VUV/O ₃ treatment can remove organic contaminants of Au surfaces without damages. The Au surfaces after the VUV/O ₃ treatment were analyzed by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results show that carbon-based contaminants were dramatically decreased and that there were no serious damages in Au surfaces by the VUV/O ₃ treatment. The Au-Au bonding with VUV/O ₃ treatment was achieved at 200 °C. The average of shear strength of about 80 MPa per unit area was obtained. Therefore, it was proved that VUV/O ₃ treatment is effective in Au-Au bonding.

原文	English
主出版物標題	2011 IEEE International 3D Systems Integration Conference, 3DIC 2011
DOIs	https://doi.org/10.1109/3DIC.2012.6263015
出版狀態	Published - 2011
事件	2011 IEEE International 3D Systems Integration Conference, 3DIC 2011 - Osaka, Japan 持續時間: 2012 1月 31 → 2012 2月 2

出版系列

名字	2011 IEEE International 3D Systems Integration Conference, 3DIC 2011

Conference

Conference	2011 IEEE International 3D Systems Integration Conference, 3DIC 2011
國家/地區	Japan
城市	Osaka
期間	12-01-31 → 12-02-02

All Science Journal Classification (ASJC) codes

控制與系統工程

存取文件

10.1109/3DIC.2012.6263015

其它文件與鏈接

引用此

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title = "Low temperature Au-Au bonding with VUV/O 3 treatment",

abstract = "This paper describes low temperature Au-Au bonding with vacuum ultraviolet (VUV) irradiation in the presence of oxygen gas. The VUV/O 3 treatment can remove organic contaminants of Au surfaces without damages. The Au surfaces after the VUV/O 3 treatment were analyzed by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results show that carbon-based contaminants were dramatically decreased and that there were no serious damages in Au surfaces by the VUV/O 3 treatment. The Au-Au bonding with VUV/O 3 treatment was achieved at 200 °C. The average of shear strength of about 80 MPa per unit area was obtained. Therefore, it was proved that VUV/O 3 treatment is effective in Au-Au bonding.",

author = "Akiko Okada and Masatsugu Nimura and Naoko Unami and Akitsu Shigetou and Hirokazu Noma and Katsuyuki Sakuma and Jun Mizuno and Shuichi Shoji",

year = "2011",

doi = "10.1109/3DIC.2012.6263015",

language = "English",

isbn = "9781467321891",

series = "2011 IEEE International 3D Systems Integration Conference, 3DIC 2011",

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note = "2011 IEEE International 3D Systems Integration Conference, 3DIC 2011 ; Conference date: 31-01-2012 Through 02-02-2012",

}

Okada, A, Nimura, M, Unami, N, Shigetou, A, Noma, H, Sakuma, K, Mizuno, J & Shoji, S 2011, Low temperature Au-Au bonding with VUV/O ₃ treatment. 於 2011 IEEE International 3D Systems Integration Conference, 3DIC 2011., 6263015, 2011 IEEE International 3D Systems Integration Conference, 3DIC 2011, 2011 IEEE International 3D Systems Integration Conference, 3DIC 2011, Osaka, Japan, 12-01-31. https://doi.org/10.1109/3DIC.2012.6263015

TY - GEN

T1 - Low temperature Au-Au bonding with VUV/O 3 treatment

AU - Okada, Akiko

AU - Nimura, Masatsugu

AU - Unami, Naoko

AU - Shigetou, Akitsu

AU - Noma, Hirokazu

AU - Sakuma, Katsuyuki

AU - Mizuno, Jun

AU - Shoji, Shuichi

PY - 2011

Y1 - 2011

N2 - This paper describes low temperature Au-Au bonding with vacuum ultraviolet (VUV) irradiation in the presence of oxygen gas. The VUV/O 3 treatment can remove organic contaminants of Au surfaces without damages. The Au surfaces after the VUV/O 3 treatment were analyzed by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results show that carbon-based contaminants were dramatically decreased and that there were no serious damages in Au surfaces by the VUV/O 3 treatment. The Au-Au bonding with VUV/O 3 treatment was achieved at 200 °C. The average of shear strength of about 80 MPa per unit area was obtained. Therefore, it was proved that VUV/O 3 treatment is effective in Au-Au bonding.

AB - This paper describes low temperature Au-Au bonding with vacuum ultraviolet (VUV) irradiation in the presence of oxygen gas. The VUV/O 3 treatment can remove organic contaminants of Au surfaces without damages. The Au surfaces after the VUV/O 3 treatment were analyzed by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results show that carbon-based contaminants were dramatically decreased and that there were no serious damages in Au surfaces by the VUV/O 3 treatment. The Au-Au bonding with VUV/O 3 treatment was achieved at 200 °C. The average of shear strength of about 80 MPa per unit area was obtained. Therefore, it was proved that VUV/O 3 treatment is effective in Au-Au bonding.

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DO - 10.1109/3DIC.2012.6263015

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