Low-temperature CVD carbon coatings on glass plates for flat panel display applications

Y. Tzeng, C. Liu, C. Cutshaw, Z. Chen

研究成果: Conference article同行評審

摘要

Low-temperature chemical vapour deposition processes were studied for coating carbon films on metal-coated glass plates. Thermal CVD in hydrocarbon mixtures was used for carbon deposition at temperatures between 300°C and 550°C. Carbon deposited on metal coated glass plates were examined by SEM and analyzed using a pin to disk setup in an ultra high vacuum chamber for measuring the electron emission characteristics. Using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon coatings as the cathode, current-voltage characteristics of the carbon coatings were measured and used for calculating the electric field at which electron emission started as well as calculating the field enhancement factor of the carbon coatings. Field emission of electrons from carbon coatings starting from an electric field as low as 1.4 volts per micrometer has been achieved.

原文English
頁(從 - 到)Q221-Q225
期刊Materials Research Society Symposium - Proceedings
621
DOIs
出版狀態Published - 2000
事件Electron-Emissive Materials, Vacuum Microelectronics and Flat-Panel Displays - San Francisco, CA, United States
持續時間: 2000 4月 252000 4月 27

All Science Journal Classification (ASJC) codes

  • 一般材料科學
  • 凝聚態物理學
  • 材料力學
  • 機械工業

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