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Low threshold current, low resistance 1.3 μm InAs-InGaAs quantum-dot VCSELs with fully doped DBRs grown by MBE

研究成果: Conference contribution

2   !!Link opens in a new tab 引文 斯高帕斯(Scopus)

摘要

The processing technology of 1.3μm InAs-InGaAs quantum-dot VCSELs with fully doped DBRs grown by MBE will be demonstrated. The threshold currents of the fabricated devices with 10 μm oxide-confined aperture are 0.7mA, which correspond to 890A/cm2 threshold current density. And the threshold voltage of the device is 1.03V and maximum output power is 33 μW. The series resistance is 85 Ω which is 10 times lower then our preliminary work and 3 times lower then intracavity contacted InAs-InGaAs quantum-dot VCSEL. This relatively lower resistance can even comparable with the best result reported in InGaAs oxide-confined VCSELs with intracavity contact.

原文English
主出版物標題Vertical-Cavity Surface-Emitting Lasers XI
DOIs
出版狀態Published - 2007
事件Vertical-Cavity Surface-Emitting Lasers XI - San Jose, CA, United States
持續時間: 2007 1月 242007 1月 25

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
6484
ISSN(列印)0277-786X

Other

OtherVertical-Cavity Surface-Emitting Lasers XI
國家/地區United States
城市San Jose, CA
期間07-01-2407-01-25

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程

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