The invention relates to a manufacturing method of an organic solar cell. First deposit in order a first electrode and a first transmission layer on a substrate. Then coat a photoresist layer having a preferred thickness ranging from 1000nm to 1600nm on the surface of the first transmission layer by a spin coater at a preferred spin-coating speed ranging from 3000rpm and 6000rpm for 30 seconds. Then develop an area by a photolithograph process, and coat an organic active layer in the area and on the surface of the photoresist layer by use of the spin coater at a preferred spin-coating speed ranging from 500rpm and 800rpm, in which the organic active layer has a thickness ranging from 230nm to 320nm at 500rpm.
|出版狀態||Published - 1800|