TY - JOUR
T1 - Maskless beam pen lithography based on integrated microlens array and spatial-filter array
AU - Hasan, Md Nazmul
AU - Dinh, Duc Hanh
AU - Chien, Hung Liang
AU - Lee, Yung Chun
N1 - Funding Information:
The authors would like to thank the Ministry of Science and Technology of Taiwan for financially supporting this research under contracts of MOST 104-3113-E-006-002 and MOST 104-2119-M-006-011.
Publisher Copyright:
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE).
PY - 2017/11/1
Y1 - 2017/11/1
N2 - A beam pen lithography system is proposed for ultraviolet (UV) patterning of complicated patterns in a maskless manner. The system consists of a single UV light-emitting diode (LED), a double-sided microlens/spatial-filter array (MLSFA), and a motorized x-y stage. The double-sided MLSFA contains a pinhole array sandwiched by two microlens arrays. The microlens arrays are fabricated by an excimer laser micromachining system to achieve accurate and optimized lens profiles obtained from optical simulation. Techniques have been developed in the fabrication processes to guarantee good alignment between the pinhole array and the two microlens arrays. Finally, arrayed UV spots are formed with feature size around 4 to 5 μm. Through mechanical movement of stage and intensity control on the UV LED, a number of complicated patterns are experimentally demonstrated using this type of beam pen lithography. It offers a simple, inexpensive, and portable choice on maskless UV patterning with great potential for future applications.
AB - A beam pen lithography system is proposed for ultraviolet (UV) patterning of complicated patterns in a maskless manner. The system consists of a single UV light-emitting diode (LED), a double-sided microlens/spatial-filter array (MLSFA), and a motorized x-y stage. The double-sided MLSFA contains a pinhole array sandwiched by two microlens arrays. The microlens arrays are fabricated by an excimer laser micromachining system to achieve accurate and optimized lens profiles obtained from optical simulation. Techniques have been developed in the fabrication processes to guarantee good alignment between the pinhole array and the two microlens arrays. Finally, arrayed UV spots are formed with feature size around 4 to 5 μm. Through mechanical movement of stage and intensity control on the UV LED, a number of complicated patterns are experimentally demonstrated using this type of beam pen lithography. It offers a simple, inexpensive, and portable choice on maskless UV patterning with great potential for future applications.
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U2 - 10.1117/1.OE.56.11.115104
DO - 10.1117/1.OE.56.11.115104
M3 - Article
AN - SCOPUS:85034838665
SN - 0091-3286
VL - 56
JO - Optical Engineering
JF - Optical Engineering
IS - 11
M1 - 115104
ER -