Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array

Duc Hanh Dinh, Hung Liang Chien, Yung-Chun Lee

研究成果: Article

摘要

A new type of maskless lithography system based on digital mirror device (DMD) is proposed, constructed, and experimentally demonstrated. It includes a pin-hole array sandwiched by two microlens arrays on each side, known as double-sided microlens/spatial-filter array (D-MSFA), and aligned with a DMD. Ultraviolet (UV) light reflected by DMD is first collected by the first microlens array, filtered through the pin-hole array, and then re-focused by the second microlens array into a UV spot array. Along with an obliquely scanning method, this D-MSFA/DMD-based maskless lithography system can perform not only 2D but also 3D UV patterning. Experimental testing successfully generates complicated patterns with a minimum line-width of 3.36 μm. Direct 3D patterning and 3D microfabrication are also experimentally demonstrated on a photoresist layer. Excellent profile accuracy and surface structure qualities are observed with great potentials for future 2D and 3D microfabrication in a maskless manner.

原文English
頁(從 - 到)407-415
頁數9
期刊Optics and Laser Technology
113
DOIs
出版狀態Published - 2019 五月 1

指紋

Digital devices
Lithography
lithography
Microfabrication
filters
Photoresists
Surface structure
Linewidth
Mirrors
Scanning
Testing
photoresists
ultraviolet radiation
mirrors
scanning

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

引用此文

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abstract = "A new type of maskless lithography system based on digital mirror device (DMD) is proposed, constructed, and experimentally demonstrated. It includes a pin-hole array sandwiched by two microlens arrays on each side, known as double-sided microlens/spatial-filter array (D-MSFA), and aligned with a DMD. Ultraviolet (UV) light reflected by DMD is first collected by the first microlens array, filtered through the pin-hole array, and then re-focused by the second microlens array into a UV spot array. Along with an obliquely scanning method, this D-MSFA/DMD-based maskless lithography system can perform not only 2D but also 3D UV patterning. Experimental testing successfully generates complicated patterns with a minimum line-width of 3.36 μm. Direct 3D patterning and 3D microfabrication are also experimentally demonstrated on a photoresist layer. Excellent profile accuracy and surface structure qualities are observed with great potentials for future 2D and 3D microfabrication in a maskless manner.",
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