MBE growth of ZnSe nanowires on oxidized silicon substrate

C. H. Hsiao, S. J. Chang, S. B. Wang, S. C. Hung, S. P. Chang, T. C. Li, W. J. Lin, B. R. Huang

研究成果: Article同行評審

12 引文 斯高帕斯(Scopus)

摘要

We report the growth of single crystalline ZnSe nanowires on oxidized Si(100) substrates by molecular-beam epitaxy using Au nano-particles as the catalysts. It was found that average length decreased while the average diameter increased as we increased the temperature from 230 to 320 {ring operator}C. It was also found that crystal quality of the ZnSe nanowires prepared at 320 {ring operator}C was poorer than the ZnSe nanowires prepared at 230 {ring operator}C and 280 {ring operator}C.

原文English
頁(從 - 到)572-577
頁數6
期刊Superlattices and Microstructures
46
發行號4
DOIs
出版狀態Published - 2009 10月

All Science Journal Classification (ASJC) codes

  • 一般材料科學
  • 凝聚態物理學
  • 電氣與電子工程

指紋

深入研究「MBE growth of ZnSe nanowires on oxidized silicon substrate」主題。共同形成了獨特的指紋。

引用此