Measurement uncertainty in nanometrology: Leveraging attributes of TEM and CD AFM

Hao Chih Liu, Gregory A. Dahlen, Marc Osborn, Jason R. Osborne, Lars Mininni, Bryan Tracy, Amalia Del Rosario

研究成果: Conference contribution

4 引文 斯高帕斯(Scopus)

摘要

A new method is presented to accurately determine the exact location of a transmission electron microscopy (TEM) sample extraction site using critical dimension atomic force microscopy (CD AFM), The method entails use of the CD AFM to nondestructively pre-screen the sample, thus acquiring a "finger print" of the surface morphology in the region of interest. Following TEM sample "milling" and extraction, the acquired TEM micrograph feature measurements are matched to their CD AFM counterparts. By acquiring multiple feature profiles within the same TEM sample, the matching and "unique" TEM sample location is determined independently of scaling variation between the TEM and CD AFM metrologies. This method is then used to validate CD AFM image reconstruction algorithms in the present paper.

原文English
主出版物標題2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Conference Proceedings - Synergy of Science and Technology in Instrumentation and Measurement
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(列印)1424410800, 9781424410804
DOIs
出版狀態Published - 2007
事件2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Synergy of Science and Technology in Instrumentation and Measurement - Warsaw, Poland
持續時間: 2007 5月 12007 5月 3

出版系列

名字Conference Record - IEEE Instrumentation and Measurement Technology Conference
ISSN(列印)1091-5281

Other

Other2007 IEEE Instrumentation and Measurement Technology, IMTC 2007 - Synergy of Science and Technology in Instrumentation and Measurement
國家/地區Poland
城市Warsaw
期間07-05-0107-05-03

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程

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