Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation

Chung Wei Kung, Joseph E. Mondloch, Timothy C. Wang, Wojciech Bury, William Hoffeditz, Benjamin M. Klahr, Rachel C. Klet, Michael J. Pellin, Omar K. Farha, Joseph T. Hupp

研究成果: Article同行評審

113 引文 斯高帕斯(Scopus)

摘要

Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.

原文English
頁(從 - 到)28223-28230
頁數8
期刊ACS Applied Materials and Interfaces
7
發行號51
DOIs
出版狀態Published - 2015 十二月 30

All Science Journal Classification (ASJC) codes

  • 材料科學(全部)

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