Method of fabricating Thin Transistor and Top-gate Type Thin Film Transustor

貢獻的翻譯標題: 薄膜電晶體之製備方法及頂閘極式薄膜電晶體

Chie Gau (Inventor)

研究成果: Patent

摘要

A method of fabricating a thin film transistor (TFT) and a top-gate type thin film transistor are disclosed, the method of fabricating a TFT of the present invention comprises steps: (A) providing a substrate; (B) forming a source electrode, a drain electrode, and SWCNT (singled-walled carbon nanotubes) layer on the substrate, in which the source electrode and the drain electrode are spaced in a distance and the SWCNT layer is located between the source electrode and the drain electrode; (C) forming a gate oxide layer on the SWCNT layer; (D) annealing the gate oxide layer with oxygen or nitrogen gas; and (E) forming a gate electrode on the gate oxide layer; wherein the temperature used in the step (D) for annealing is a 500° C. to 600° C.
貢獻的翻譯標題薄膜電晶體之製備方法及頂閘極式薄膜電晶體
原文English
專利號特許地5553856?
出版狀態Published - 2012 十一月 29

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