Microstructure and Electrical Characteristics of NbMoTaW Thin Films

We investigated the electrical properties and microstructures of high-entropy alloy NbMoTaW thin films prepared by radio frequency (RF) magnetron sputtering at different RF powers and substrate temperatures. Diffraction patterns indicated that the deposited films had a polycrystalline microstructure, and scanning electron microscopy results revealed that grain size was dependent on RF power and substrate temperature. The effects of processing parameters on the microstructure and electrical characteristics of the films were also investigated. The NbMoTaW alloy films are suitable for use as an electrode in sensors.