Miniature electron microscopes for lithography

Alan D. Feinerman, David A. Crewe, Dung Ching Perng, Capp A. Spindt, Paul R. Schwoebel, Albert V. Crewe

研究成果: Conference contribution

5 引文 斯高帕斯(Scopus)

摘要

Two inexpensive and extremely accurate methods for fabricating miniature 10 - 50 kV and 0.5 - 10 kV electron beam columns have been developed: `slicing,' and `stacking.' Two or three miniature columns could be used to perform a 20 nm or better alignment of an x-ray mask to a substrate. An array of miniature columns could be used for rapid wafer inspection and high throughput electron beam lithography. The column fabrication methods combine the precision of semiconductor processing and fiber optic technologies to create macroscopic structures consisting of charged particle sources, deflecting and focusing electrodes, and detectors. The overall performance of the miniature column also depends on the emission characteristics of the micromachined electron source which is currently being investigated.

原文English
主出版物標題Proceedings of SPIE - The International Society for Optical Engineering
發行者Publ by Society of Photo-Optical Instrumentation Engineers
頁面262-273
頁數12
ISBN(列印)0819414891, 9780819414892
DOIs
出版狀態Published - 1994 一月 1
事件Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - San Jose, CA, USA
持續時間: 1994 二月 281994 三月 1

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
2194
ISSN(列印)0277-786X

Other

OtherElectron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
城市San Jose, CA, USA
期間94-02-2894-03-01

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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