Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory

Yung Chun Lee, Cheng Hsin Chuang, Di Bao Wang, Chuan Pu Liu, Fei Bin Hsiao

研究成果: Conference contribution

摘要

In this study, the mechanism of LADI is investigated theoretically and experimentally. First of all, a numerical simulation of the pulsed laser heating is developed. The simulation is based on the laser-material interaction and a ID thermal analysis with both solid and a molten liquid under consideration. For given laser fluence, pulse duration (30ns, KrF 248nm excimer laser), and material properties, the complete history of temperature and melting depth during the laser heating is obtained. Secondly, since the surface melting is happening with a short period of time, the imprinting process is modeled based as a quick releasing of pre-loaded strain in the quartz mold and silicon sample. Such a transient behavior can be characterized by elastodynamics and wave motion. Based on the analysis, the imprinting velocity of the quartz surface is equal to the fast released pressure divided by acoustic impedance of quartz. By conjunction of the pulsed laser heating simulation and the surface movement equation, the relationship between the applied pre-loaded pressure and the imprinting depth can be quantitative determined provided the laser characteristics and material properties are given. It is found that at lower contact pressure, the imprinting depth is almost linear proportional to the contact pressure, while at higher contact pressure is most determined by the laser fluence. This new theoretical model not only provides a good insight to the fundamental mechanism of LADI but also a useful tool for quantitative control or optimization of LADI processes.

原文English
主出版物標題2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
編輯M. Laudon, B. Romanowicz
頁面680-683
頁數4
出版狀態Published - 2005
事件2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 - Anaheim, CA, United States
持續時間: 2005 5月 82005 5月 12

出版系列

名字2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

Other

Other2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005
國家/地區United States
城市Anaheim, CA
期間05-05-0805-05-12

All Science Journal Classification (ASJC) codes

  • 一般工程

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