Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory

Yung-Chun Lee, Cheng Hsin Chuang, Di Bao Wang, Chuan-Pu Liu, Fei Bin Hsiao

研究成果: Conference contribution

摘要

In this study, the mechanism of LADI is investigated theoretically and experimentally. First of all, a numerical simulation of the pulsed laser heating is developed. The simulation is based on the laser-material interaction and a ID thermal analysis with both solid and a molten liquid under consideration. For given laser fluence, pulse duration (30ns, KrF 248nm excimer laser), and material properties, the complete history of temperature and melting depth during the laser heating is obtained. Secondly, since the surface melting is happening with a short period of time, the imprinting process is modeled based as a quick releasing of pre-loaded strain in the quartz mold and silicon sample. Such a transient behavior can be characterized by elastodynamics and wave motion. Based on the analysis, the imprinting velocity of the quartz surface is equal to the fast released pressure divided by acoustic impedance of quartz. By conjunction of the pulsed laser heating simulation and the surface movement equation, the relationship between the applied pre-loaded pressure and the imprinting depth can be quantitative determined provided the laser characteristics and material properties are given. It is found that at lower contact pressure, the imprinting depth is almost linear proportional to the contact pressure, while at higher contact pressure is most determined by the laser fluence. This new theoretical model not only provides a good insight to the fundamental mechanism of LADI but also a useful tool for quantitative control or optimization of LADI processes.

原文English
主出版物標題2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
編輯M. Laudon, B. Romanowicz
頁面680-683
頁數4
出版狀態Published - 2005 十二月 1
事件2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 - Anaheim, CA, United States
持續時間: 2005 五月 82005 五月 12

出版系列

名字2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

Other

Other2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005
國家United States
城市Anaheim, CA
期間05-05-0805-05-12

指紋

Laser heating
Pulsed lasers
Lasers
Quartz
Materials properties
Melting
Acoustic impedance
Excimer lasers
Thermoanalysis
Molten materials
Laser pulses
Silicon
Computer simulation
Liquids

All Science Journal Classification (ASJC) codes

  • Engineering(all)

引用此文

Lee, Y-C., Chuang, C. H., Wang, D. B., Liu, C-P., & Hsiao, F. B. (2005). Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory. 於 M. Laudon, & B. Romanowicz (編輯), 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings (頁 680-683). (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).
Lee, Yung-Chun ; Chuang, Cheng Hsin ; Wang, Di Bao ; Liu, Chuan-Pu ; Hsiao, Fei Bin. / Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory. 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 編輯 / M. Laudon ; B. Romanowicz. 2005. 頁 680-683 (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).
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abstract = "In this study, the mechanism of LADI is investigated theoretically and experimentally. First of all, a numerical simulation of the pulsed laser heating is developed. The simulation is based on the laser-material interaction and a ID thermal analysis with both solid and a molten liquid under consideration. For given laser fluence, pulse duration (30ns, KrF 248nm excimer laser), and material properties, the complete history of temperature and melting depth during the laser heating is obtained. Secondly, since the surface melting is happening with a short period of time, the imprinting process is modeled based as a quick releasing of pre-loaded strain in the quartz mold and silicon sample. Such a transient behavior can be characterized by elastodynamics and wave motion. Based on the analysis, the imprinting velocity of the quartz surface is equal to the fast released pressure divided by acoustic impedance of quartz. By conjunction of the pulsed laser heating simulation and the surface movement equation, the relationship between the applied pre-loaded pressure and the imprinting depth can be quantitative determined provided the laser characteristics and material properties are given. It is found that at lower contact pressure, the imprinting depth is almost linear proportional to the contact pressure, while at higher contact pressure is most determined by the laser fluence. This new theoretical model not only provides a good insight to the fundamental mechanism of LADI but also a useful tool for quantitative control or optimization of LADI processes.",
author = "Yung-Chun Lee and Chuang, {Cheng Hsin} and Wang, {Di Bao} and Chuan-Pu Liu and Hsiao, {Fei Bin}",
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Lee, Y-C, Chuang, CH, Wang, DB, Liu, C-P & Hsiao, FB 2005, Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory. 於 M Laudon & B Romanowicz (編輯), 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings, 頁 680-683, 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005, Anaheim, CA, United States, 05-05-08.

Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory. / Lee, Yung-Chun; Chuang, Cheng Hsin; Wang, Di Bao; Liu, Chuan-Pu; Hsiao, Fei Bin.

2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 編輯 / M. Laudon; B. Romanowicz. 2005. p. 680-683 (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).

研究成果: Conference contribution

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T1 - Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory

AU - Lee, Yung-Chun

AU - Chuang, Cheng Hsin

AU - Wang, Di Bao

AU - Liu, Chuan-Pu

AU - Hsiao, Fei Bin

PY - 2005/12/1

Y1 - 2005/12/1

N2 - In this study, the mechanism of LADI is investigated theoretically and experimentally. First of all, a numerical simulation of the pulsed laser heating is developed. The simulation is based on the laser-material interaction and a ID thermal analysis with both solid and a molten liquid under consideration. For given laser fluence, pulse duration (30ns, KrF 248nm excimer laser), and material properties, the complete history of temperature and melting depth during the laser heating is obtained. Secondly, since the surface melting is happening with a short period of time, the imprinting process is modeled based as a quick releasing of pre-loaded strain in the quartz mold and silicon sample. Such a transient behavior can be characterized by elastodynamics and wave motion. Based on the analysis, the imprinting velocity of the quartz surface is equal to the fast released pressure divided by acoustic impedance of quartz. By conjunction of the pulsed laser heating simulation and the surface movement equation, the relationship between the applied pre-loaded pressure and the imprinting depth can be quantitative determined provided the laser characteristics and material properties are given. It is found that at lower contact pressure, the imprinting depth is almost linear proportional to the contact pressure, while at higher contact pressure is most determined by the laser fluence. This new theoretical model not only provides a good insight to the fundamental mechanism of LADI but also a useful tool for quantitative control or optimization of LADI processes.

AB - In this study, the mechanism of LADI is investigated theoretically and experimentally. First of all, a numerical simulation of the pulsed laser heating is developed. The simulation is based on the laser-material interaction and a ID thermal analysis with both solid and a molten liquid under consideration. For given laser fluence, pulse duration (30ns, KrF 248nm excimer laser), and material properties, the complete history of temperature and melting depth during the laser heating is obtained. Secondly, since the surface melting is happening with a short period of time, the imprinting process is modeled based as a quick releasing of pre-loaded strain in the quartz mold and silicon sample. Such a transient behavior can be characterized by elastodynamics and wave motion. Based on the analysis, the imprinting velocity of the quartz surface is equal to the fast released pressure divided by acoustic impedance of quartz. By conjunction of the pulsed laser heating simulation and the surface movement equation, the relationship between the applied pre-loaded pressure and the imprinting depth can be quantitative determined provided the laser characteristics and material properties are given. It is found that at lower contact pressure, the imprinting depth is almost linear proportional to the contact pressure, while at higher contact pressure is most determined by the laser fluence. This new theoretical model not only provides a good insight to the fundamental mechanism of LADI but also a useful tool for quantitative control or optimization of LADI processes.

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M3 - Conference contribution

AN - SCOPUS:32044455821

SN - 0976798522

T3 - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

SP - 680

EP - 683

BT - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

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A2 - Romanowicz, B.

ER -

Lee Y-C, Chuang CH, Wang DB, Liu C-P, Hsiao FB. Modeling of laser assisted direct imprinting process based on pulsed laser heating and elastodynamic theory. 於 Laudon M, Romanowicz B, 編輯, 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 2005. p. 680-683. (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).