Modeling of plume dynamics in laser ablation processes for thin film deposition of materials

J. N. Leboeuf, K. R. Chen, J. M. Donato, D. B. Geohegan, C. L. Liu, A. A. Puretzky, R. F. Wood

研究成果: Article同行評審

46 引文 斯高帕斯(Scopus)

摘要

The transport dynamics of laser‐ablated neutral/plasma plumes are of significant interest for film growth by pulsed‐laser deposition of materials, since the magnitude and kinetic energy of the species arriving at the deposition substrate are key processing parameters. Dynamical calculations of plume propagation in vacuum and in background gas have been performed using particle‐in‐cell hydrodynamics, continuum gasdynamics, and scattering models. Results from these calculations are presented and compared with experimental observations.

原文English
頁(從 - 到)2203-2209
頁數7
期刊Physics of Plasmas
3
發行號5
DOIs
出版狀態Published - 1996 5月

All Science Journal Classification (ASJC) codes

  • 凝聚態物理學

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