Modification of aliphatic self-assembled monolayers by free-radical- dominant plasma: The role of the plasma composition

Chih Chiang Weng, Jiunn Der Liao, Yi Te Wu, Ming Chen Wang, Ruth Klauser, Michael Grunze, Michael Zharnikov

研究成果: Article同行評審

27 引文 斯高帕斯(Scopus)

摘要

Modification of octadecanethiolate self-assembled monolayers on Au by nitrogen-oxygen or argon-oxygen downstream microwave plasma with a low oxygen content (estimated below several percent) has been studied by synchrotron-based high-resolution X-ray photoelectron spectroscopy and water contact angle measurements. For both types of plasma, the primary processes were found to be the loss of conformational and orientational order and the oxidation of the alkyl matrix and headgroup-substrate interface. At the same time, the film modification occurred much faster and with different intermediates for the nitrogen plasma than for the argon plasma. The reasons for these differences are considered in terms of the different reactivities and different efficiencies of the energy transfer between the plasma constituents in these two types of plasma.

原文English
頁(從 - 到)10093-10099
頁數7
期刊Langmuir
20
發行號23
DOIs
出版狀態Published - 2004 11月 9

All Science Journal Classification (ASJC) codes

  • 材料科學(全部)
  • 凝聚態物理學
  • 表面和介面
  • 光譜
  • 電化學

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