TY - JOUR
T1 - Nano-imprint fabrication and light extraction simulation of photonic crystals on OLED
AU - Yu, Jay Wang Chieh
AU - Guo, Yoou Bin
AU - Chen, Jiun Yeu
AU - Hong, Franklin Chau Nan
PY - 2008
Y1 - 2008
N2 - A two-dimensional photonic crystal (PC) structure introduced into the anode layer of an organic light-emitting diode (OLED) was designed to enhance the light extraction efficiency. Using the plane wave expansion method and the finite-difference time-domain method to simulate the optical properties, we found that the extraction efficiency of the OLED device can be greatly enhanced by modifying the lattice constant of the PC array. In our simulation results, the enhancement of the extraction efficiency can approach 60% for the optimized square PC pattern with a period of ∼500nm in the OLED device emitting at the center wavelength of 510nm. In this work, the PC pattern was also fabricated to implement the simulation results via the UV-curing nano-imprint technique. To maximize the enhancement effect, the residual layer on the imprinted surface should be really thin over a large area and could thus be easily removed by the RIE process.
AB - A two-dimensional photonic crystal (PC) structure introduced into the anode layer of an organic light-emitting diode (OLED) was designed to enhance the light extraction efficiency. Using the plane wave expansion method and the finite-difference time-domain method to simulate the optical properties, we found that the extraction efficiency of the OLED device can be greatly enhanced by modifying the lattice constant of the PC array. In our simulation results, the enhancement of the extraction efficiency can approach 60% for the optimized square PC pattern with a period of ∼500nm in the OLED device emitting at the center wavelength of 510nm. In this work, the PC pattern was also fabricated to implement the simulation results via the UV-curing nano-imprint technique. To maximize the enhancement effect, the residual layer on the imprinted surface should be really thin over a large area and could thus be easily removed by the RIE process.
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U2 - 10.1117/12.806888
DO - 10.1117/12.806888
M3 - Conference article
AN - SCOPUS:62449331882
SN - 0277-786X
VL - 7140
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
M1 - 71400C
T2 - Lithography Asia 2008
Y2 - 4 November 2008 through 6 November 2008
ER -