Nanometer-structure writing on Si(100) surfaces using a non-contact-mode atomic force microscope

Dawen Wang, Liming Tsau, K. L. Wang

研究成果: Article同行評審

35 引文 斯高帕斯(Scopus)

摘要

Nanometer structures were written on Si(100) surfaces by use of a non-contact-mode atomic force microscope. The silicon oxide was formed beneath the tip by applying a negative bias voltage between a p+ silicon tip and the samples. The writing resolution was mainly determined by the local chemical reactions induced by the tip and a minimum line width of about 10 nm was obtained, which is close to that achieved by scanning tunneling microscope and contact-mode atomic force microscope writing.

原文English
頁(從 - 到)1415-1417
頁數3
期刊Applied Physics Letters
65
發行號11
DOIs
出版狀態Published - 1994

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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