Neodymium-doped GaAs light-emitting diodes

研究成果: Conference article同行評審

1 引文 斯高帕斯(Scopus)

摘要

Nd-doped semiconductor light-emitting diodes were fabricated by implanting Nd ions into a GaAs epi-layer. The fabricated GaAs:Nd diodes show good current-voltage characteristics with a typical reverse breakdown voltage between 8 and 12 V. By injecting minority carriers into the diodes, Nd3+ related emissions were observed, at 77 K, in the 0.92, 1.11, and 1.3 μm regions. These electroluminescence signals correspond to the transitions from Nd3+ 4F3/2 state to the Nd3+ 4I9/2, 4I11/2 and 4I13/2 states, respectively. The measured external quantum efficiency of the GaAs:Nd diodes at 77 K, was 5×10-7.

原文English
頁(從 - 到)351-355
頁數5
期刊Materials Research Society Symposium - Proceedings
422
DOIs
出版狀態Published - 1996
事件Proceedings of the 1996 MRS Spring Symposium - San Francisco, CA, USA
持續時間: 1996 4月 81996 4月 11

All Science Journal Classification (ASJC) codes

  • 一般材料科學
  • 凝聚態物理學
  • 材料力學
  • 機械工業

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