摘要
A new InGaP/GaAs double delta-doped heterojunction bipolar transistor (D3HBT) has been fabricated successfully and demonstrated. Due to the employment of delta-doped sheets, the potential spikes at emitter-base (E-B) and base-collector (B-C) heterojunctions are suppressed considerably. Therefore, good transistor performance including higher current gain and lower knee voltage are obtained.
原文 | English |
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頁(從 - 到) | 270-272 |
頁數 | 3 |
期刊 | Thin Solid Films |
卷 | 345 |
發行號 | 2 |
DOIs | |
出版狀態 | Published - 1999 5月 21 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 表面和介面
- 表面、塗料和薄膜
- 金屬和合金
- 材料化學