摘要
Nitride-based light-emitting diodes (LEDs) with Mg-doped In 0.23Ga0.77N capping layers were successfully fabricated. Compared to Mg-doped GaN layers, it was found that we could achieve a much larger hole concentration from Mg-doped In0.23Ga0.77N layers. It was also found that we could reduce the 20 mA operation voltage from 3.78 to 3.37 V by introducing a 5-nm-thick In 0.23Ga0.77N layer on top of the p-GaN layer. Furthermore, it was found that output intensity of LEDs with In0.23Ga0.77N capping layer was much larger, particularly at elevated temperatures.
原文 | English |
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頁(從 - 到) | 2567-2570 |
頁數 | 4 |
期刊 | IEEE Transactions on Electron Devices |
卷 | 50 |
發行號 | 12 |
DOIs | |
出版狀態 | Published - 2003 12月 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 電氣與電子工程