Nitride-Based LEDs with p-InGaN Capping Layer

S. J. Chang, C. H. Chen, P. C. Chang, Y. K. Su, P. C. Chen, Y. D. Jhou, H. Hung, S. M. Wang, B. R. Huang

研究成果: Article同行評審

56 引文 斯高帕斯(Scopus)

摘要

Nitride-based light-emitting diodes (LEDs) with Mg-doped In 0.23Ga0.77N capping layers were successfully fabricated. Compared to Mg-doped GaN layers, it was found that we could achieve a much larger hole concentration from Mg-doped In0.23Ga0.77N layers. It was also found that we could reduce the 20 mA operation voltage from 3.78 to 3.37 V by introducing a 5-nm-thick In 0.23Ga0.77N layer on top of the p-GaN layer. Furthermore, it was found that output intensity of LEDs with In0.23Ga0.77N capping layer was much larger, particularly at elevated temperatures.

原文English
頁(從 - 到)2567-2570
頁數4
期刊IEEE Transactions on Electron Devices
50
發行號12
DOIs
出版狀態Published - 2003 12月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 電氣與電子工程

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