摘要
We report the growth of InGaAs-based epitaxial layers by metallorganic chemical vapor deposition (MOCVD) and the fabrication of 60 μm diameter InGaAs PIN photodiode. With -5 V applied bias, it was found that reverse leakage current and capacitance of the photodiode were only 105 pA and 0.475 pF, respectively. It was also found that measured 3 dB bandwidth for the packaged photodiode was 3.83 GHz when biased at -5 V. For a given bandwidth of 1 kHz and a given bias of -5 V, it was found that the noise-equivalent-powers of our InGaAs PIN photodiodes were 4.53× 10-14 W at 1.31 μm and 2.95× 10-14 W at 1.55 μm, which correspond to normalize detectivity values of 3.69× 1012 cm Hz0.5 W-1 at 1.31 μm and 5.67× 1012 cm Hz0.5 W-1 at 1.55 μm.
原文 | English |
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頁(從 - 到) | J307-J309 |
期刊 | Journal of the Electrochemical Society |
卷 | 155 |
發行號 | 11 |
DOIs | |
出版狀態 | Published - 2008 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 可再生能源、永續發展與環境
- 表面、塗料和薄膜
- 電化學
- 材料化學