摘要
We demonstrate a novel Al0.66In0.34As0.85Sb0.15/In0.53Ga0.47As double-barrier resonant tunneling diode grown by metalorganic vapor phase epitaxy. A high peak-to-valley current ratio of 46 and a peak current density of 22 kA/cm2 were obtained at room temperature.
| 原文 | English |
|---|---|
| 頁(從 - 到) | 146-148 |
| 頁數 | 3 |
| 期刊 | IEEE Electron Device Letters |
| 卷 | 21 |
| 發行號 | 4 |
| DOIs | |
| 出版狀態 | Published - 2000 4月 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 電氣與電子工程
指紋
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