Novel methods of nanoscale wire formation

Sharka M. Prokes, Kang L. Wang

研究成果: Article同行評審

107 引文 斯高帕斯(Scopus)

摘要

One of the most popular techniques in used to produce artificial structure of quantum wires with sub-100-nm features is nanofabrication. This technique involves the formation of a pattern on material and the transfer of this pattern to form nanometer-sized features. In general, the pattern is formed by selective irradiation of a photoresist, using electrons, ions, or ultraviolet light. The patterned regions of the resist are then dissolved in a specific solvent. The final nanoscale features are formed in the underlying material by the use of dry etching techniques.

原文English
頁(從 - 到)13-19
頁數7
期刊MRS Bulletin
24
發行號8
DOIs
出版狀態Published - 1999 八月

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Physical and Theoretical Chemistry

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