TY - JOUR
T1 - Novel polymeric thin film deposition system
T2 - Injector-apparatus/PECVD reactor
AU - Cazeca, Mario J.
AU - Kuo, Changshu
AU - Kumar, Jayant
N1 - Funding Information:
This work was supported by the Missile Defense Agency (MDA) SBIR Phase II contract number DASG60-01-C-0065. The authors thank Mr. Cecil Comptois for helping with the electronics and software that runs the injector and Dianne Cazeca for helping with this manuscript.
PY - 2004/11
Y1 - 2004/11
N2 - A monomer injection apparatus has been developed to be used with a plasma enhanced chemical vapor deposition (PECVD) reactor to deposit polymeric thin films from precursor monomers with boiling points ranging from low to very high. The system (PECVD reactor-injection apparatus) allows deposition of layered, as well as doped, polymeric thin films. Thin film deposition from a mixture of two monomers with very different boiling points - thiophene and 2,3-dihydrothieno [3,4-b]-1,4-dioxin (EDOT) - and other monomers like dicyclopentadiene (DCPD) and 2-chloro-p-xylene has been performed to demonstrate the capabilities of the deposition system. Thermal analysis of the deposited thin film using microthermal analysis (μTA™) and differential scanning calorimetry performed on deposited films is also presented. The injection apparatus associated with a PECVD reactor proved to be a very versatile tool for novel polymeric thin film deposition.
AB - A monomer injection apparatus has been developed to be used with a plasma enhanced chemical vapor deposition (PECVD) reactor to deposit polymeric thin films from precursor monomers with boiling points ranging from low to very high. The system (PECVD reactor-injection apparatus) allows deposition of layered, as well as doped, polymeric thin films. Thin film deposition from a mixture of two monomers with very different boiling points - thiophene and 2,3-dihydrothieno [3,4-b]-1,4-dioxin (EDOT) - and other monomers like dicyclopentadiene (DCPD) and 2-chloro-p-xylene has been performed to demonstrate the capabilities of the deposition system. Thermal analysis of the deposited thin film using microthermal analysis (μTA™) and differential scanning calorimetry performed on deposited films is also presented. The injection apparatus associated with a PECVD reactor proved to be a very versatile tool for novel polymeric thin film deposition.
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U2 - 10.1081/MA-200035364
DO - 10.1081/MA-200035364
M3 - Article
AN - SCOPUS:10644291773
SN - 1060-1325
VL - 41 A
SP - 1447
EP - 1458
JO - Journal of Macromolecular Science - Pure and Applied Chemistry
JF - Journal of Macromolecular Science - Pure and Applied Chemistry
IS - 12
ER -