Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing

Fei Bin Hsiao, Di Bao Wang, Chun Ping Jen, Yung-Chun Lee, Cheng Hsin Chuang

研究成果: Conference contribution

摘要

The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.

原文English
主出版物標題2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
編輯M. Laudon, B. Romanowicz
頁面598-601
頁數4
出版狀態Published - 2005 十二月 1
事件2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 - Anaheim, CA, United States
持續時間: 2005 五月 82005 五月 12

出版系列

名字2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

Other

Other2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005
國家United States
城市Anaheim, CA
期間05-05-0805-05-12

指紋

Melting
Contact resistance
Heat transfer
Lasers
Processing
Annealing
Solidification
Molten materials
Laser pulses
Hot Temperature

All Science Journal Classification (ASJC) codes

  • Engineering(all)

引用此文

Hsiao, F. B., Wang, D. B., Jen, C. P., Lee, Y-C., & Chuang, C. H. (2005). Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. 於 M. Laudon, & B. Romanowicz (編輯), 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings (頁 598-601). (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).
Hsiao, Fei Bin ; Wang, Di Bao ; Jen, Chun Ping ; Lee, Yung-Chun ; Chuang, Cheng Hsin. / Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 編輯 / M. Laudon ; B. Romanowicz. 2005. 頁 598-601 (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).
@inproceedings{29c25900496f4cd08939579b8088700c,
title = "Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing",
abstract = "The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.",
author = "Hsiao, {Fei Bin} and Wang, {Di Bao} and Jen, {Chun Ping} and Yung-Chun Lee and Chuang, {Cheng Hsin}",
year = "2005",
month = "12",
day = "1",
language = "English",
isbn = "0976798522",
series = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings",
pages = "598--601",
editor = "M. Laudon and B. Romanowicz",
booktitle = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings",

}

Hsiao, FB, Wang, DB, Jen, CP, Lee, Y-C & Chuang, CH 2005, Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. 於 M Laudon & B Romanowicz (編輯), 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings, 頁 598-601, 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005, Anaheim, CA, United States, 05-05-08.

Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. / Hsiao, Fei Bin; Wang, Di Bao; Jen, Chun Ping; Lee, Yung-Chun; Chuang, Cheng Hsin.

2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 編輯 / M. Laudon; B. Romanowicz. 2005. p. 598-601 (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).

研究成果: Conference contribution

TY - GEN

T1 - Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing

AU - Hsiao, Fei Bin

AU - Wang, Di Bao

AU - Jen, Chun Ping

AU - Lee, Yung-Chun

AU - Chuang, Cheng Hsin

PY - 2005/12/1

Y1 - 2005/12/1

N2 - The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.

AB - The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.

UR - http://www.scopus.com/inward/record.url?scp=32044438270&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=32044438270&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:32044438270

SN - 0976798522

T3 - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

SP - 598

EP - 601

BT - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

A2 - Laudon, M.

A2 - Romanowicz, B.

ER -

Hsiao FB, Wang DB, Jen CP, Lee Y-C, Chuang CH. Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. 於 Laudon M, Romanowicz B, 編輯, 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 2005. p. 598-601. (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).