Observation of dislocation etch pits in epitaxial lateral overgrowth GaN by wet etching

T. C. Wen, W. I. Lee, J. K. Sheu, G. C. Chi

研究成果: Article

23 引文 斯高帕斯(Scopus)

摘要

This work investigates dislocation etch pits in epitaxial lateral overgrowth (ELO) GaN by wet etching. A mixture of H2SO4 and H3PO4 was used as an etching solution. SEM and AFM were employed to observe the surface topography. For the as-grown sample, SEM images show the flat, smooth surface without any pits or hillocks. After the chemical etching, hexagonal shaped etch pits were observed at the edge of ELO GaN. AFM observation of etched ELO GaN displayed high densities of etch pits clustered in the "window" region and the coalescent line of two growing fronts. In contrast, the overgrowth region was nearly free of etch pits. Moreover, we observed that different sizes of etch pits dominated in "window" region and coalescent region. This implied different types dislocations dominated in these regions.

原文English
頁(從 - 到)555-558
頁數4
期刊Solid-State Electronics
46
發行號4
DOIs
出版狀態Published - 2002 四月 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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