Off-plane diffraction of extreme ultraviolet light caused by line width roughness

Wen Yu Chen, Chun Hung Lin

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

A simple and fast method using extreme ultraviolet off-plane scatterometry for in-line line width roughness (LWR) metrology is proposed. The effect of line roughness on diffraction is numerically investigated. LWR diffracts light into the off-plane of the incidence direction, thereby causing a decrement in specular reflection. The amplitude of LWR can be quantified by detecting the decrement of the specular reflection. The angular distribution of m = 0 and n ≠ 0 diffraction orders is related to the LWR spectrum. LWR spectral analysis is possible by scanning the angular distribution of diffracted light. This study can be applied to both amplitude measurement and spectral analysis of LWR for in-line metrology.

原文English
頁(從 - 到)79-84
頁數6
期刊Thin Solid Films
522
DOIs
出版狀態Published - 2012 11月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 表面和介面
  • 表面、塗料和薄膜
  • 金屬和合金
  • 材料化學

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