On the electrodeposition of arsenic in a choline chloride/ethylene glycol deep eutectic solvent

Po Kai Wang, Yi Ting Hsieh, I. Wen Sun

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

The electrochemical behavior of arsenic(III) is investigated in the ethaline deep eutectic solvent (DES) that is obtained by mixing 1 mol eq. of choline chloride and 2 mol eq. of ethylene glycol using As2O3 as the As(III) source. Cyclic voltammetry and rotating disc voltammetry experiments indicate that the reduction of As(III) to As is a single step three electron transfer process with slow kinetics. Chronoamperometry experiments indicate that the deposition of arsenic at a glassy carbon electrode involves with an overpotential-driven three dimensional instantaneous nucleation/growth process. The calculated number density of the nuclei increases as a function of applied overpotential. Amorphous arsenic coatings are prepared using constant potential, constant current, and pulse potential electrolysis experiments. The morphology of the electrodeposits is examined by SEM.

原文English
頁(從 - 到)D204-D209
期刊Journal of the Electrochemical Society
164
發行號4
DOIs
出版狀態Published - 2017

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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