摘要
The shallow defect evolution in Si-implanted and -annealed liquid-encapsulated Czochralski-grown GaAs is investigated by photoluminescence experiments. Three major emission lines are found. The first emission line located at 1.492 eV corresponds to the SiGa-CAs radiative recombination. The remaining two lines located at 1.44 and 1.40 eV are shown to correspond to GaI-SiAs and VAs-SiAs radiative recombinations, respectively. The effects of these three shallow centers on the silicon activation efficiency are discussed with respect to different annealing and implantation conditions.
| 原文 | English |
|---|---|
| 頁(從 - 到) | 1246-1252 |
| 頁數 | 7 |
| 期刊 | Journal of Applied Physics |
| 卷 | 65 |
| 發行號 | 3 |
| DOIs | |
| 出版狀態 | Published - 1989 |
All Science Journal Classification (ASJC) codes
- 一般物理與天文學
指紋
深入研究「On the nature of the silicon activation efficiency in liquid-encapsulated Czochralski-grown GaAs by photoluminescence」主題。共同形成了獨特的指紋。引用此
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