TY - JOUR
T1 - Optimal Accelerated Test Framework for Time-Dependent Dielectric Breakdown Lifetime Parameter Estimation
AU - Wu, Yi Da
AU - Yang, Kexin
AU - Hsu, Shu Han
AU - Milor, Linda
N1 - Funding Information:
Manuscript received May 7, 2020; revised July 22, 2020; accepted August 12, 2020. Date of publication September 1, 2020; date of current version November 24, 2020. This work was supported by the Defense Advanced Research Projects Agency (DARPA) under Contract HR0011-16-C-0040. (Corresponding author: Linda Milor.) The authors are with the School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332 USA (e-mail: yidawu@ece.gatech.edu; linda.milor@ece.gatech.edu).
Publisher Copyright:
© 1993-2012 IEEE.
PY - 2020/12
Y1 - 2020/12
N2 - A framework is presented to identify an optimal accelerated test region and accelerated test conditions for the accelerated test of logic circuits for time-dependent dielectric breakdown (TDDB). Both gate-oxide breakdown and middle-of-line (MOL) TDDB are investigated. Separate test regions are identified for each wearout mechanism. Two digital circuits, an 8-bit fast Fourier transform (FFT) circuit and a Leon3 microprocessor are used to demonstrate the capability of the framework. The lifetimes of standard cells are combined to compute the circuit lifetime, by combining the Weibull distributions that characterize the lifetime distribution of each of the standard cells. The errors in estimating wearout parameters consist of two parts: the error in estimating the wearout parameters at accelerated test conditions and the forecasting accuracy at use conditions. By estimating the errors in wearout parameters at accelerated test conditions, the optimal accelerated test region is found by determining the test conditions producing a minimal error. Test conditions are selected by minimizing the error at use conditions. Given a forecasting error target, the required sample size at each test condition is found. This work also considers the impact of variation in circuit size, type, and process parameters on the selection of optimal test conditions.
AB - A framework is presented to identify an optimal accelerated test region and accelerated test conditions for the accelerated test of logic circuits for time-dependent dielectric breakdown (TDDB). Both gate-oxide breakdown and middle-of-line (MOL) TDDB are investigated. Separate test regions are identified for each wearout mechanism. Two digital circuits, an 8-bit fast Fourier transform (FFT) circuit and a Leon3 microprocessor are used to demonstrate the capability of the framework. The lifetimes of standard cells are combined to compute the circuit lifetime, by combining the Weibull distributions that characterize the lifetime distribution of each of the standard cells. The errors in estimating wearout parameters consist of two parts: the error in estimating the wearout parameters at accelerated test conditions and the forecasting accuracy at use conditions. By estimating the errors in wearout parameters at accelerated test conditions, the optimal accelerated test region is found by determining the test conditions producing a minimal error. Test conditions are selected by minimizing the error at use conditions. Given a forecasting error target, the required sample size at each test condition is found. This work also considers the impact of variation in circuit size, type, and process parameters on the selection of optimal test conditions.
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U2 - 10.1109/TVLSI.2020.3017950
DO - 10.1109/TVLSI.2020.3017950
M3 - Article
AN - SCOPUS:85097355423
SN - 1063-8210
VL - 28
SP - 2658
EP - 2671
JO - IEEE Transactions on Very Large Scale Integration (VLSI) Systems
JF - IEEE Transactions on Very Large Scale Integration (VLSI) Systems
IS - 12
M1 - 9184236
ER -