Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser

Yu Hsun Chou, Shuo Chen Chen, Wing Sing Cheung

研究成果: Conference contribution

摘要

In this study, we calculate the minimum size of SIM-structured nanolasers and propose corresponding fabrication methods to achieve optical mode volumes and physical volumes close to those of LSP-mode nanolasers.

原文English
主出版物標題CLEO
主出版物子標題Fundamental Science, CLEO:FS 2023
發行者Optical Society of America
ISBN(電子)9781957171258
DOIs
出版狀態Published - 2023
事件CLEO: Fundamental Science, CLEO:FS 2023 - Part of Conference on Lasers and Electro-Optics 2023 - San Jose, United States
持續時間: 2023 5月 72023 5月 12

出版系列

名字CLEO: Fundamental Science, CLEO:FS 2023

Conference

ConferenceCLEO: Fundamental Science, CLEO:FS 2023 - Part of Conference on Lasers and Electro-Optics 2023
國家/地區United States
城市San Jose
期間23-05-0723-05-12

All Science Journal Classification (ASJC) codes

  • 儀器
  • 一般電腦科學
  • 電子、光磁材料
  • 原子與分子物理與光學
  • 空間與行星科學
  • 控制與系統工程
  • 電氣與電子工程

指紋

深入研究「Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser」主題。共同形成了獨特的指紋。

引用此