Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographies

C. H. Lin, L. A. Wang, H. L. Chen

研究成果: Conference article同行評審

6 引文 斯高帕斯(Scopus)

摘要

The hexamethyldisiloxane (HMDSO) film was demonstrated as a bilayer bottom antireflective coating (BARC) layer for KrF and ArF lithographies. The materials of the bilayer can be varied to have suitable optical constants as BARC materials, by adjusting the gas flow rate ratio. The bilayer was also shown to be capable of providing large thickness controlled tolerance.

原文English
頁(從 - 到)3323-3327
頁數5
期刊Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
18
發行號6
DOIs
出版狀態Published - 2000 十一月
事件44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA
持續時間: 2000 五月 302000 六月 2

All Science Journal Classification (ASJC) codes

  • 凝聚態物理學
  • 電氣與電子工程

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