The hexamethyldisiloxane (HMDSO) film was demonstrated as a bilayer bottom antireflective coating (BARC) layer for KrF and ArF lithographies. The materials of the bilayer can be varied to have suitable optical constants as BARC materials, by adjusting the gas flow rate ratio. The bilayer was also shown to be capable of providing large thickness controlled tolerance.
|頁（從 - 到）||3323-3327|
|期刊||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|出版狀態||Published - 2000 十一月|
|事件||44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA|
持續時間: 2000 五月 30 → 2000 六月 2
All Science Journal Classification (ASJC) codes