摘要
An electrostatic particle-in-cell simulation code is developed to investigate the interaction between plasma and material surfaces in the presence of secondary electron emission. Kinetic ions are included into the numerical simulation to incorporate the process of ion bombardment on the material surfaces. The influences of the secondary electron emission on sheath dynamics are further investigated, which is induced by ions on top of electrons.
| 原文 | English |
|---|---|
| 文章編號 | 7001683 |
| 頁（從 - 到） | 675-682 |
| 頁數 | 8 |
| 期刊 | IEEE Transactions on Plasma Science |
| 卷 | 43 |
| 發行號 | 2 |
| DOIs | |
| 出版狀態 | Published - 2015 二月 1 |
指紋
All Science Journal Classification (ASJC) codes
- Nuclear and High Energy Physics
- Condensed Matter Physics
引用此文
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Particle-in-cell simulation of plasma sheath dynamics with kinetic ions. / Huang, Chun Wei; Chen, Yen Chiao; Nishimura, Yasutaro.
於: IEEE Transactions on Plasma Science, 卷 43, 編號 2, 7001683, 01.02.2015, p. 675-682.研究成果: Article
TY - JOUR
T1 - Particle-in-cell simulation of plasma sheath dynamics with kinetic ions
AU - Huang, Chun Wei
AU - Chen, Yen Chiao
AU - Nishimura, Yasutaro
PY - 2015/2/1
Y1 - 2015/2/1
N2 - An electrostatic particle-in-cell simulation code is developed to investigate the interaction between plasma and material surfaces in the presence of secondary electron emission. Kinetic ions are included into the numerical simulation to incorporate the process of ion bombardment on the material surfaces. The influences of the secondary electron emission on sheath dynamics are further investigated, which is induced by ions on top of electrons.
AB - An electrostatic particle-in-cell simulation code is developed to investigate the interaction between plasma and material surfaces in the presence of secondary electron emission. Kinetic ions are included into the numerical simulation to incorporate the process of ion bombardment on the material surfaces. The influences of the secondary electron emission on sheath dynamics are further investigated, which is induced by ions on top of electrons.
UR - http://www.scopus.com/inward/record.url?scp=85027942258&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85027942258&partnerID=8YFLogxK
U2 - 10.1109/TPS.2014.2382876
DO - 10.1109/TPS.2014.2382876
M3 - Article
AN - SCOPUS:85027942258
VL - 43
SP - 675
EP - 682
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
SN - 0093-3813
IS - 2
M1 - 7001683
ER -