Particle-in-cell simulation of plasma sheath dynamics with kinetic ions

Chun Wei Huang; Yen Chiao Chen; Yasutaro Nishimura

doi:10.1109/TPS.2014.2382876

Particle-in-cell simulation of plasma sheath dynamics with kinetic ions

Chun Wei Huang, Yen Chiao Chen, Yasutaro Nishimura

太空與電漿科學研究所

研究成果: Article › 同行評審

12 引文斯高帕斯（Scopus）

摘要

An electrostatic particle-in-cell simulation code is developed to investigate the interaction between plasma and material surfaces in the presence of secondary electron emission. Kinetic ions are included into the numerical simulation to incorporate the process of ion bombardment on the material surfaces. The influences of the secondary electron emission on sheath dynamics are further investigated, which is induced by ions on top of electrons.

原文	English
文章編號	7001683
頁（從 - 到）	675-682
頁數	8
期刊	IEEE Transactions on Plasma Science
卷	43
發行號	2
DOIs	https://doi.org/10.1109/TPS.2014.2382876
出版狀態	Published - 2015 2月 1

All Science Journal Classification (ASJC) codes

核能與高能物理
凝聚態物理學

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10.1109/TPS.2014.2382876

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Particle-in-cell simulation of plasma sheath dynamics with kinetic ions

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