Pattern Matching for Feasible and Efficient Physical Design Verification of Cell Libraries

  • Chan Liang Wu
  • , Chih Wen Lu

研究成果: Article同行評審

摘要

This study introduces a pattern-matching method to en- hance the efficiency and accuracy of physical verification of cell libraries. The pattern-matching method swiftly compares layouts of all I/O units within a specific area, identifying significantly different I/O units. Utilizing random sampling or full permutation can improve the efficiency of veri- fication of I/O cell libraries. All permutations within an 11-unit I/O unit library can produce 39,916,800 I/O units (11!), far exceeding the capacity of current IC layout software. However, the proposed algorithm generates the layout file within 1 second and significantly reduces the DRC verifica- tion time from infinite duration to 63 seconds executing 415 DRC rules. This approach effectively improves the potential to detect layer density er- rors in I/O libraries. While conventional processes detect layer density and DRC issues only when adjacent I/O cells are placed due to layout size and machine constraints, in this work, the proposed algorithm selectively gener- ates multiple distinct combinations of I/O cells for verification, crucial for improving the accuracy of physical design.

原文English
頁(從 - 到)34-45
頁數12
期刊IEICE Transactions on Electronics
E108.C
發行號1
DOIs
出版狀態Published - 2025 1月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 電氣與電子工程

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